Shin-Ohtsuka will conduct the trial test with the compatible solvent, and confirm cleanliness result with following analytical tools.
Analytical balances, Microscope, Liquid particle counter, Oil content analyzer, etc.
Analytical tools
Spin Coater:POLOS-SPIN150(SPS-Europe)
Wafer Spin Coater for making the wafer with particles.
Steps
- Set the wafer
- Prepare 2ml of contaminated solvent by syringe
- By setting speed to 500rpm/s, drop the contaminated solvent at speed of 100rpm/s
- Spin 10 sec at speed of 500rpm/s, increase to 2000rpm at speed of 1000rpm/s
- 35 sec at 2000rpm for drying
YPI-N series (Automatic transfer) Wafer surface inspection equipment.
〈Equipment specification〉
- Wafer size: Max 200mm 200mm
- Scanning method: X-Y Scan/θ-X Scan (Spiral scanning)
- Process time: □200mm/4 min/Φ200mm/3 min
- Transfer unit: Robot (Back side vacuum/Edge clamp)
- Size: W1,320mm X D1,000mm X H1,700mm
- Weight: 800Kg
- Power consumption: 1.5kW(100V)
- Wafer type: Si wafer, Coating with wafer
- Minimum inspection range: 0.2um (Si wafer)
Gas chromatography
Particle removing machine (Laminar flow clean room)
Soxhlet extractor
Karl Fisher moisture titration
Ion chromatography for Measurement of fluorinated ion